RESUMO
We have developed a method for encoding phase and amplitude in microscopic computer-generated holograms (microtags) for security applications. An 8 x 8 cell phase-only and an 8 x 8 cell phase-and-amplitude microtag design has been exposed in photoresist by the extreme-ultraviolet (13.4-nm) lithography tool developed at Sandia National Laboratories. Each microtag measures 80 microm x 160 microm and contains features that are 0.2 microm wide. Fraunhofer zone diffraction patterns can be obtained from fabricated microtags without any intervening optics and compare favorably with predicted diffraction patterns.
RESUMO
Using 14-nm wavelength illumination, we have imaged 0.1-µm-wide lines and spaces in single-layer thin films of the highy sensitive, negative, chemically amplified resist AZ PN114 by usingboth a Schwarzschild 20× camera and an Offner ring field 1× optical system. For soft-x-ray projection lithography the approximate 0.2-µm absorption length in resists at 14-nm wavelength necessitates a multilayer resist system. To explore further the requirements of the imaging layer of such a system, we have transferred patterns, exposed by a high-resolution electron beam in a 60-nm-thick layer of AZ PN114, into the underlying layers of a trilevel structure. Significant pattern edge noise and resist granularity were found. It remains to be determined whether the observed noise is dominated by statistical fluctuations in dose or by resist chemistry. We also investigated pinhole densities in these films and found them to increase from 0.2 cm(-2) for 380-mm-thick films to 15 cm(-2) for 50-nm-thick films.
RESUMO
The sensitivity, ion photodesorption, and lithographic performance of selected novolac-based chemically amplified resists have been studied at an exposure wavelength of 140 Å. Flood exposures of the resits AZ PF514, AZ PN114, and SAL 601 yield D(0.9) values of 2.5-3.5 mJ/cm(2) for 0.25-µm-thick films. Contrast values range from 3 for AZ PN114 to 5 for SAL 601. Photodesorption of fragment ions induced by 140-Å radiation has been examined in AZ PN114 by using time-of-flight mass spectrometry and compared with poly(methylmethacrylate) (PMMA). Mass-integrated ion desorption yields from AZ PN114 are found to be â¼ 90 times less per exposure than from PMMA. Soft-x-ray projection imaging in AZ PF514 and SAL 601 has been characterized by use of a multilayer-coated 20 × Schwarzschild objective and a transmissive Ge/Si mask illuminated by a laser plasma source.
RESUMO
Soft-x-ray projection imaging is demonstrated by the use of 14-nm radiation from a laser plasma source and a single-surface multilayer-coated ellipsoidal condenser. Aberrations in the condenser and the Schwarzschild imaging objective are characterized and correlated with imaging performance. A new Schwarzschild housing, designed for improved alignment stability, is described.
RESUMO
Projection imaging of 0.1-microm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist and reactive ion etching. Low-contrast modulation at 0.05-microm lines and spaces is observed in polymethylmethacrylate.
RESUMO
A fringe visibility method for sizing particles 10 microm and larger has been developed. As the image of a particle scans across a variable frequency grid, the transmitted light signal oscillates with varying visibility. The visibility goes through a null at a well-defined point where the particle diameter approximates the local grid spacing. Several optical arrangements implementing the variable frequency grid technique have been tested. Using classified alumina and pulverized coal particles we obtained good agreement between size distributions measured by this technique and those from a commercial off-line analyzer. However, our optical arrangement and signal processing techniques require further development to reduce them to practice.
