RESUMO
We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated.
Assuntos
Nanotecnologia/métodos , Óptica e Fotônica , Algoritmos , Alumínio/química , Desenho de Equipamento , Luz , Modelos Estatísticos , Nanoestruturas , Fotoquímica/métodosRESUMO
Nanoscale ridge aperture antennas have been shown to have high transmission efficiency and confined nanoscale radiation in the near field region compared with regularly-shaped apertures. The radiation enhancement is attributed to the fundamental electric-magnetic field propagating in the TE(10) mode concentrated in the gap between the ridges. This paper reports experimental demonstration of field enhancement using such ridge antenna apertures in a bowtie shape for the manufacture of nanometer size structures using an NSOM (near field scanning optical microscopy) probe integrated with nanoscale bowtie aperture. Consistent lines with width of 59 nm and as small as 24 nm have be written on photoresist using such probes.
