RESUMO
One of the critical steps in the fabrication of complex optical interference filters is the precise control of the thickness of the layers during the fabrication process. However, the definition of the optimal optical monitoring strategy remains a challenge as it relies on user experience and there is no reliable automatic determination of this strategy. Here, we propose a semi-automated method that allows the determination of the optimal strategy. It is based on the combination of trinary mappings to select spectral regions that are compatible with optical monitoring and the use of the reflected phase error at a single wavelength versus optical monitoring wavelength. We show how this procedure can be used for the determination of either a single optical monitoring wavelength or a multi-wavelength procedure of a complex filter and confirm these theoretical results with an experimental demonstration.
RESUMO
Single cavity Fabry-Perot filters are one of the most popular designs for the production of narrow bandpass filters. The usual deposition strategy to create such filters based on optical monitoring at the filter central wavelength is well-known and has proven its strength over decades. We review in this paper the possible optical methods to monitor such a filter during production and analyze their strengths and weaknesses. Then, we discuss a new monitoring procedure, mixing different methods, to minimize the production errors of this filter while maintaining a precise filter centering. This strategy is applied on different bandpass filter designs.
