RESUMO
We have examined the correlations between direct surface-finish metrology techniques and normalincidence, soft x-ray reflectance measurements of highly polished x-ray multilayer mirrors. We find that, to maintain high reflectance, the rms surface roughness of these mirrors must be less than ~ 1 Å over the range of spatial frequencies extending approximately from 1 to 100 µm(-1)1 (i.e., spatial wavelengths from 1 µm to 10 nm). This range of spatial frequencies is accessible directly only through scanning-probe metrology. Because the surface-finish Fourier spectrum of such highly polished mirrors is described approximately by an inverse power law (unlike a conventional surface), bandwidth-limited rms roughness values measured with instruments that are sensitive to only lower spatial frequencies (i.e., optical or stylus profileres) are generally uncorrelated with the soft x-ray reflectance and can lead to erroneous conclusions regarding the expected performance of substrates for x-ray mirrors.
RESUMO
We describe a variety of technologies for patterning transmissive and reflective soft x-ray projectionlithography masks containing features as small as 0.1 µm. The transmission masks fabricated for use at 13 nm are of one type, a Ge-absorbing layer patterned on a boron-doped Si membrane. Reflective masks were patterned by various methods that included absorbing layers formed on top of multilayer reflectors, multilayer-reflector-coating removal by reactive ion etching, and ion damage of multilayer regions by ion implantation. For the first time, we believe, a process for absorber repair that does not significantly damage the reflectance of the multilayer coating on the reflection mask is demonstrated.
RESUMO
Soft-x-ray projection imaging is demonstrated by the use of 14-nm radiation from a laser plasma source and a single-surface multilayer-coated ellipsoidal condenser. Aberrations in the condenser and the Schwarzschild imaging objective are characterized and correlated with imaging performance. A new Schwarzschild housing, designed for improved alignment stability, is described.
RESUMO
A molybdenum/silicon multilayer-coated 1:1 ring-field optic with a numerical aperture of 0.0835 is used to carry out soft-x-ray projection imaging with undulator radiation at 12.9 nm. An ideal optic of this type should be able to image 0.1-µm features with a contrast exceeding 90% at this wavelength. The useful resolution of our ring-field optic is experimentally found to be approximately 0.2 µm, probably because of the presence of substrate figuring errors.
RESUMO
Projection imaging of 0.1-microm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist and reactive ion etching. Low-contrast modulation at 0.05-microm lines and spaces is observed in polymethylmethacrylate.
RESUMO
We demonstrate nearly diffraction-limited printing of 0.2-microm features, using soft x rays of approximately 36-nm wavelength. An open-stencil transmission mask with minimum features of 4 microm was imaged by a twentyfold-reduction Schwarzschild-type objective onto silicon wafers coated with various e-beam resists. Implications for soft-x-ray projection lithography are discussed.
