Stability of extreme ultraviolet multilayer coatings to low energy proton bombardment.

In this work we present results of an new experiment related to low energy protons bombardments on nano-structured optical coatings. Multilayer structures protected by different capping layers have been fabricated and exposed to low energy protons (1 keV). The experimental parameters have been selected considering the potential application of the coatings to solar mission instrumentation. Future solar missions will investigate the Sun from very close distances and optical components are constantly exposed to low energy ion particles irradiation. The experiment was repeated fixing the proton flux while varying the total dose accumulated. Results show that physical processes occurred at the uppermost interfaces can strongly damage the structure.

Optimization of graded multilayer designs for astronomical X-ray telescopes.

We developed a systematic method for optimizing the design of depth-graded multilayers for astronomical hard-x-ray and soft-gamma-ray telescopes based on the instrument's bandpass and the field of view. We apply these methods to the design of the conical-approximation Wolter I optics employed by the balloon-borne High Energy Focusing Telescope, using W/Si as the multilayer materials. In addition, we present optimized performance calculations of mirrors, using other material pairs that are capable of extending performance to photon energies above the W K-absorption edge (69.5 keV), including Pt/C, Ni/C, Cu/Si, and Mo/Si.

Surface finish requirements for soft x-ray mirrors.

We have examined the correlations between direct surface-finish metrology techniques and normalincidence, soft x-ray reflectance measurements of highly polished x-ray multilayer mirrors. We find that, to maintain high reflectance, the rms surface roughness of these mirrors must be less than ~ 1 Å over the range of spatial frequencies extending approximately from 1 to 100 µm(-1)1 (i.e., spatial wavelengths from 1 µm to 10 nm). This range of spatial frequencies is accessible directly only through scanning-probe metrology. Because the surface-finish Fourier spectrum of such highly polished mirrors is described approximately by an inverse power law (unlike a conventional surface), bandwidth-limited rms roughness values measured with instruments that are sensitive to only lower spatial frequencies (i.e., optical or stylus profileres) are generally uncorrelated with the soft x-ray reflectance and can lead to erroneous conclusions regarding the expected performance of substrates for x-ray mirrors.

Mask technologies for soft-x-ray projection lithography at 13 nm.

We describe a variety of technologies for patterning transmissive and reflective soft x-ray projectionlithography masks containing features as small as 0.1 µm. The transmission masks fabricated for use at 13 nm are of one type, a Ge-absorbing layer patterned on a boron-doped Si membrane. Reflective masks were patterned by various methods that included absorbing layers formed on top of multilayer reflectors, multilayer-reflector-coating removal by reactive ion etching, and ion damage of multilayer regions by ion implantation. For the first time, we believe, a process for absorber repair that does not significantly damage the reflectance of the multilayer coating on the reflection mask is demonstrated.

Soft-x-ray projection lithography experiments using Schwarzschild imaging optics.

Soft-x-ray projection imaging is demonstrated by the use of 14-nm radiation from a laser plasma source and a single-surface multilayer-coated ellipsoidal condenser. Aberrations in the condenser and the Schwarzschild imaging objective are characterized and correlated with imaging performance. A new Schwarzschild housing, designed for improved alignment stability, is described.

Soft-x-ray projection imaging with a 1:1 ring-field optic.

A molybdenum/silicon multilayer-coated 1:1 ring-field optic with a numerical aperture of 0.0835 is used to carry out soft-x-ray projection imaging with undulator radiation at 12.9 nm. An ideal optic of this type should be able to image 0.1-µm features with a contrast exceeding 90% at this wavelength. The useful resolution of our ring-field optic is experimentally found to be approximately 0.2 µm, probably because of the presence of substrate figuring errors.

Diffraction-limited soft-x-ray projection imaging using a laser plasma source.

Projection imaging of 0.1-microm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist and reactive ion etching. Low-contrast modulation at 0.05-microm lines and spaces is observed in polymethylmethacrylate.

XUV optical constants of single-crystal GaAs and sputtered C, Si, Cr(3)C(2), Mo, and W.

The optical constants for sputtered films of C, Si, Mo, and W are presented for photon wavelengths from 13.3 to 304 A, and for single-crystal GaAs and sputtered Cr(3)C(2) from 13.3 to 1302 A. The best-fit values of the optical constants, and also the surface roughness parameter sigma, are obtained from reflectance vs incidence angle measurements using a nonlinear, least-squares curve fitting algorithm. These optical constants are significantly different from previously reported data in portions of this spectral region. The new optical data result in good agreement between theory and reflectance measurements of soft x-ray multilayer coatings made from the sputtered materials.

Soft-x-ray projection lithography: printing of 0.2-microm features using a 20:1 reduction.

We demonstrate nearly diffraction-limited printing of 0.2-microm features, using soft x rays of approximately 36-nm wavelength. An open-stencil transmission mask with minimum features of 4 microm was imaged by a twentyfold-reduction Schwarzschild-type objective onto silicon wafers coated with various e-beam resists. Implications for soft-x-ray projection lithography are discussed.

Optical constants for thin films of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Ir, Os, Pt, and Au from 24 A to 1216 A.

Reflectance vs incidence angle measurements have been performed from 24 A to 1216 A on electron-beam evaporated samples of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Os, Ir, Pt, and Au, and using a nonlinear least-squares curve-fitting technique, the optical constants have been determined. Independently measured values of the incident beam polarization, film thicknesses, and film surface roughnesses are incorporated into the derivation of the optical constants. Additionally, Auger electron spectroscopy depth profiling measurements have been performed on each sample to characterize sample composition including oxidation and contamination.

Optical constants for thin films of C, diamond, Al, Si, and CVD SIC from 24 A to 1216 A.

A method for deriving optical constants from reflectance vs angle of incidence measurements using a nonlinear least-squares curve-fitting technique based on the chi(2) test of fit is presented and used to derive optical constants for several thin-film materials. The curve-fitting technique incorporates independently measured values for the film surface roughness, film thickness, and incident beam polarization. The technique also provides a direct method for estimating probable errors in the derived optical constants. Data are presented from 24 A to 1216 A for thin-film samples of C, synthetic diamond, Al, Si, and CVD SiC. Auger electron spectroscopy depth profiling measurements were performed on some of the samples to characterize sample composition including oxidation and contamination.

Amorphous silicon carbide coatings for extreme ultraviolet optics.

Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 A were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.