RESUMO
To increase the performance of optical systems, a good antireflective coating is required to ensure low reflectance and high transmittance of optical surfaces. Further problems, such as fogging that causes light scattering, negatively affect the image quality. This implies that other functional properties are also required. Presented here is a highly promising combination of an antireflective double nanostructure on top of an antifog coating with long-term stable properties, generated in a commercial plasma-ion-assisted coating chamber. It is demonstrated that the nanostructures do not affect the antifog properties and can be successfully used for many applications.
RESUMO
Nanostructured low-index layers are useful as the last layers of antireflective (AR) coatings because they can broaden their spectral ranges and improve the performance for oblique light incidence. Structuring of evaporated organic layers by plasma opens a route to produce inorganic interference stacks and low-index layers in the same vacuum process. The organic material uracil has been investigated as a template material for AR nanostructures. An additional plasma-treatment step was added to the manufacturing process, which decreases the organic fraction of the coating substantially. As a result, a better environmental stability and higher transmission in the ultraviolet range was achieved.
