Structured illumination ptychography and at-wavelength characterization with an EUV diffuser at 13.5†nm wavelength.

Structured illumination is essential for high-performance ptychography. Especially in the extreme ultraviolet (EUV) range, where reflective optics are prevalent, the generation of structured beams is challenging and, so far, mostly amplitude-only masks have been used. In this study, we generate a highly structured beam using a phase-shifting diffuser optimized for 13.5 nm wavelength and apply this beam to EUV ptychography. This tailored illumination significantly enhances the quality and resolution of the ptychography reconstructions. In particular, when utilizing the full dynamics range of the detector, the resolution has been improved from 125 nm, when using an unstructured beam, to 34 nm. Further, ptychography enables the quantitative measurement of both the amplitude and phase of the EUV diffuser at 13.5 nm wavelength. This capability allows us to evaluate the influence of imperfections and contaminations on its "at wavelength" performance, paving the way for advanced EUV metrology applications and highlighting its importance for future developments in nanolithography and related fields.

Design of computer-generated holograms based on semi-rigorous simulations of sub-wavelength structures.

Conventional design methods for computer-generated holograms often rely on the scalar diffraction theory because the calculation effort of rigorous simulations is too high. But for sub-wavelength lateral feature sizes or large deflection angles, the performance of realized elements will show distinct deviations from the expected scalar behavior. We propose a new design method that overcomes this issue by incorporating high-speed semi-rigorous simulation techniques that allow the modeling of light propagation at an accuracy close to the rigorous methods. This includes an approach to solve the inverse problem of calculating a geometric structure that is able to form a certain physical field distribution.

Second harmonic generation under doubly resonant lattice plasmon excitation.

Second harmonic generation is enhanced at the surface lattice resonance in plasmonic nanoparticle arrays. We carried out a parametric investigation on two-dimensional lattices composed of gold nanobars where the centrosymmetry is broken at oblique incidence. We study the influence of the periodicity, the incidence angle and the direction of the linear input polarization on the second harmonic generation. Excitation of the surface lattice resonance either at the fundamental or second harmonic wavelength, achieved by varying the incidence angle, enhance the conversion efficiency. As a special case, we demonstrate that both the wavelengths can be simultaneously in resonance for a specific period of the lattice. In this double resonant case, maximum second harmonic power is achieved.

Optical properties of black silicon structures ALD-coated with Al2O3.

Atomic layer deposited (ALD) Al2O3coatings were applied on black silicon (b-Si) structures. The coated nanostructures were investigated regarding their reflective and transmissive behaviour. For a systematic study of the influence of the Al2O3coating, ALD coatings with a varying layer thickness were deposited on three b-Si structures with different morphologies. With a scanning electron microscope the morphological evolution of the coating process on the structures was examined. The optical characteristics of the different structures were investigated by spectral transmission and reflection measurements. The usability of the structures for highly efficient absorbers and antireflection (AR) functionalities in the different spectral regions is discussed.

Ultrafast farfield simulation of non-paraxial computer generated holograms.

The simulation of large-area diffractive optical elements (DOEs) is challenging when non-paraxial propagation and coupling effects between neighboring structures shall be considered. We developed a novel method for the farfield simulation of DOEs, especially computer-generated holograms (CGHs) with lateral feature sizes in the wavelength range. It uses a machine learning approach to predict the optical function based on geometry parameters. Therefore, training data are calculated by physical simulation methods to create a linear regression model. With the trained model a very fast computation of the farfield is possible with high conformity to results of rigorous methods.

Enhancement of third harmonic generation induced by surface lattice resonances in plasmonic metasurfaces.

We investigate experimentally third harmonic generation (THG) from plasmonic metasurfaces consisting of two-dimensional rectangular lattices of centrosymmetric gold nanobars. By varying the incidence angle and the lattice period, we show how surface lattice resonances (SLRs) at the involved wavelengths are the major contributors in determining the magnitude of the nonlinear effects. A further boost on THG is observed when we excite together more than one SLR, either at the same or at different frequency. When such multiple resonances take place, interesting phenomena are observed, such as maximum THG enhancement for counter-propagating surface waves along the metasurface, and cascading effect emulating a third-order nonlinearity.

Macroscopic wave-optical simulation of dielectric metasurfaces.

We propose a novel method for the wave-optical simulation of diffractive optical elements (DOEs) like metasurfaces or computer-generated holograms (CGHs). Existing techniques mostly rely on the assumption of local periodicity to predict the performance of elements. The utilization of a specially adapted finite-difference beam propagation method (BPM) allows the semi-rigorous simulation of entire DOEs within a reasonable runtime due to linear scaling with the number of grid points. Its applicability is demonstrated by the simulation of a metalens and a polarization-dependent beamsplitter, both based on effective-medium metasurfaces. A comparison shows high conformity to rigorous simulations.

Diffuse scattering due to stochastic disturbances of 1D-gratings on the example of line edge roughness.

Diffuse scattering of optical one-dimensional gratings becomes increasingly critical as it constrains the performance, e.g., of grating spectrometers. In particular, stochastic disturbances of the ideal grating structure provoke straylight. In this paper, the straylight spectrum of stochastically disturbed gratings is examined. First, a 1D-method is presented that allows to calculate 2D-diffuse scattering of arbitrarily polarized light originating from stochastic disturbances of the grating geometry on the basis of standard optical simulation tools. Within the scope of this method an enormous reduction of computational effort is achieved compared to the full 2D-simulation approach, i.e., the computation time can be reduced by several orders of magnitude. Hence, the method also allows to address even large period gratings that are not possible to calculate within a full 2D-approach. In analogy to scattering theories for surface roughness the method relies on typical characteristics of straylight originating from small disturbances, that the angle resolved scattering (ARS) can be separated into a product of the power spectral density describing the 2D stochastic process and additional factors depending on the undisturbed 1D grating structure. In a second part, an analytical model within Fourier optics utilizing thin element approximation (TEA) describing the wide angle scattering of lamellar gratings disturbed by line edge roughness (LER) for TE-polarized light is derived and verified by applying the 1D-simulation method. For shallow gratings, we find an excellent agreement between simulation and TEA over the whole transmission half space. In addition, this model allows a descriptive understanding of the underlying physical effects and, accordingly, the influence of relevant parameters (grating geometry, refractive indices, illumination) onto the scattering spectra is discussed. Further, it is shown that LER-scattering can be described within a modified Rayleigh-Rice-ARS usually found within the frame of surface roughness.

Comparison of hyperspectral imaging spectrometer designs and the improvement of system performance with freeform surfaces.

Hyperspectral-grating-based imaging spectrometer systems with F/3 and covering the visual-near-infrared (420-1000 nm) spectral range are investigated for monitoring Earth's environmental changes. The systems have an entrance slit of 24 µm and a 6.5 nm spectral resolution. Both smile and keystone distortions are smaller than 20% of the pixel pitch. We benefit from the development in freeform technology and design 15 different systems with the help of off-axis aspheric and freeform surfaces. The potential of each system is explored with the help of nonspherical surfaces. Cross comparisons between different system types are summarized to give their advantages and disadvantages. In the end, detailed tolerancing of one selected system is presented to show the feasibility for fabrication.

175 nm period grating fabricated by i-line proximity mask-aligner lithography.

We report the fabrication of periodic structures with a critical dimension of 90 nm on a fused silica substrate by i-line (λ=365 nm) proximity mask-aligner lithography. This realization results from the combination of the improvements of the optical system in the mask aligner (known as MO exposure optics), short-period phase-mask optimization, and the implementation of self-aligned double patterning (SADP). A 350 nm period grating is transferred into a sacrificial polymer layer and coated with an aluminum layer. The removal of the metal initially present on the horizontal surfaces and on top of the polymer grating leaves a 175 nm period grating on the wafer, which can be used as a wire grid polarizer. A computation of the efficiency is performed from the measured profile and confirms the deep-blue visible to infra-red operation range.

Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography.

In this paper we report different methods to improve the stray light performance of binary spectrometer gratings fabricated by electron beam lithography. In particular, we report the optimization concerns about spurious stray light peaks, also known as "Rowland ghosts". As already known these Rowland ghosts arise from a non-optimized stitching process of special subareas needed in order to fabricate large area gratings. One approach to reduce the impact of the stitching errors is the technique of "multi-pass-exposure" (MPE). Furthermore, the potential of a direct improvement of the stitching accuracy via special calibration parameters is examined. In both cases the effects on the stray light performance were determined by angle resolved scattering measurements. The achieved results show that specific calibration parameters of an e-beam writer have a strong influence on the strength of the Rowland ghosts and that their recalibration combined with an adapted writing regime reduces the peaks significantly.

Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography.

Diffractive mask-aligner lithography allows printing structures that have a sub-micrometer resolution by using non-contact mode. For such a purpose, masks are often designed to operate with monochromatic linearly polarized light, which is obtained by placing a spectral filter and a polarizer in the beam path. We propose here a mask design that includes a wire-grid polarizer (WGP) on the top side of a photo-mask and a diffractive element on the bottom one to print a 350 nm period grating by using a classical mask-aligner in proximity exposure mode. Linearly polarizing locally an unpolarized incident beam is only possible by using a WGP on the top side of the mask. This configuration opens the possibility to use different linear polarization orientation on a single mask and allows to print high resolution structures with different orientation within one exposure.

250 nm period grating transferred by proximity i-line mask-aligner lithography.

This Letter, describes a fabrication method based on a high refractive index binary phase mask combined with a suitable illumination setup, which produces a close to normal incidence illumination, to fabricate sub-micrometer diffraction gratings. The method uses the i-line (365 nm) of a mercury lamp spectrum in a mask-aligner in proximity mode, to avoid any contact between the mask and the wafer, which is normally used to produce high resolution structures. The transfer of the structure in a fused silica wafer demonstrates that mask-aligner lithography can produce high aspect ratio sub-wavelength structures without resorting to any contact between mask and wafer.

Pulse compression grating fabrication by diffractive proximity photolithography.

We report about a newly devised throughput-scalable fabrication method for high-quality periodic submicron structures. The process is demonstrated for optical transmission gratings in fused silica with a period of 800 nm (1250 lines/mm) to be used in laser pulse compression. The technology is based on an innovative advancement of i-line proximity photolithography performed in a mask aligner. The aerial image is encoded in a rigorously optimized electron-beam-written three-level phase mask which is illuminated by an adapted multipole configuration of incidence angles. In comparison to conventional proximity lithography, the process enables a significantly higher resolution while maintaining a good depth of focus--in contrast to lithography based on direct Talbot-imaging. Details about the grating fabrication process and characterization of fabricated pulse compression grating wafers are presented. The gratings show a diffraction efficiency of 97% at a wavelength of 1030 nm and a wavefront error comparable to gratings fabricated by electron-beam lithography.

Mode shaping in semiconductor broad area lasers by monolithically integrated phase structures.

By broadening the stripe width of the active waveguide region, it is possible to extract high optical powers from semiconductor broad area lasers. However, a weak output beam quality, optical filamentation, and high peak power densities will result, which are invoked by the amplification of higher order modes. We show an approach to influence the optical field inside the resonator by integrating optical phase structures directly into the waveguide. Those elements offer the possibility to enlarge the active gain area for the desired fundamental laser mode, while additional diffraction losses for higher order modes are generated, thus achieving an improved beam quality. We report on considerations in designing those elements and demonstrate a first experimental realization.

Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources.

Laser produced plasma sources are considered attractive for high-volume extreme-ultraviolet (EUV) lithography because of their high power at the target wavelength 13.5 nm. However, besides the required EUV light, a large amount of infrared (IR) light from the CO2 drive laser is scattered and reflected from the plasma as well as from the EUV mirrors in the optical system. Since these mirrors typically consist of molybdenum and silicon, the reflectance at IR wavelengths is even higher than in the EUV, which leads to high energy loads in the optical system. One option to reduce this is to structure the EUV multilayer, in particular the collector mirror, with an IR grating that has a high IR-suppression in the zeroth order. In this paper, the characterization of such an optical element is reported, including the IR-diffraction efficiency, the EUV performance (reflectance and scattering), and the relevant surface roughness. The measurement results are directly linked to the individual manufacturing steps.

High numerical aperture hybrid optics for two-photon polymerization.

We report on an immersion hybrid optics specially designed for focusing ultrashort laser pulses into a polymer for direct laser writing via two-photon polymerization. The hybrid optics allows for well-corrected focusing over a large working distance range of 577 µm with a numerical aperture (NA) of 1.33 and low internal dispersion. We combine the concepts of an aplanatic solid immersion lens (ASIL) for achieving a high NA with a diffractive optical element (DOE) for correction of aberrations. To demonstrate the improvements for volume structuring of the polymer, we compare the achievable structure sizes of our optics with a commercially available oil-immersion objective (100x, NA=1.4).

Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect.

The Talbot effect is utilized for micro-fabrication of periodic microstructures via proximity lithography in a mask aligner. A novel illumination system, referred to as MO Exposure Optics, allows to control the effective source shape and accordingly the angular spectrum of the illumination light. Pinhole array photomasks are employed to generate periodic high-resolution diffraction patterns by means of self-imaging. They create a demagnified image of the effective source geometry in their diffraction pattern which is printed to photoresist. The proposed method comprises high flexibility and sub-micron resolution at large proximity gaps. Various periodic structures have been generated and are presented.

Advanced mask aligner lithography: new illumination system.

A new illumination system for mask aligner lithography is presented. The illumination system uses two subsequent microlens-based Köhler integrators. The second Köhler integrator is located in the Fourier plane of the first. The new illumination system uncouples the illumination light from the light source and provides excellent uniformity of the light irradiance and the angular spectrum. Spatial filtering allows to freely shape the angular spectrum to minimize diffraction effects in contact and proximity lithography. Telecentric illumination and ability to precisely control the illumination light allows to introduce resolution enhancement technologies (RET) like customized illumination, optical proximity correction (OPC) and source-mask optimization (SMO) in mask aligner lithography.

Highly efficient three-level blazed grating in the resonance domain.

We designed, fabricated, and characterized three-level transmission gratings in the resonance domain with reduced shadowing losses based on a three-wave interference mechanism. A new technological approach allows for fabrication of homogeneous and large area multilevel gratings without spurious artifacts. To our knowledge, the measured efficiency of 86% exhibits the largest value yet reported for a multilevel transmission grating in the resonance domain close to normal incidence.