Quantum dot vertical-cavity surface-emitting lasers covering the 'green gap'.

Semiconductor vertical-cavity surface-emitting lasers (VCSELs) with wavelengths from 491.8 to 565.7 nm, covering most of the 'green gap', are demonstrated. For these lasers, the same quantum dot (QD) active region was used, whereas the wavelength was controlled by adjusting the cavity length, which is difficult for edge-emitting lasers. Compared with reports in the literature for green VCSELs, our lasers have set a few world records for the lowest threshold, longest wavelength and continuous-wave (CW) lasing at room temperature. The nanoscale QDs contribute dominantly to the low threshold. The emitting wavelength depends on the electron-photon interaction or the coupling between the active layer and the optical field, which is modulated by the cavity length. The green VCSELs exhibit a low-thermal resistance of 915 kW-1, which benefits the CW lasing. Such VCSELs are important for small-size, low power consumption full-color displays and projectors.

Enhanced Light Emission due to Formation of Semi-polar InGaN/GaN Multi-quantum Wells.

InGaN/GaN multi-quantum wells (MQWs) are grown on (0001) sapphire substrates by metal organic chemical vapor deposition (MOCVD) with special growth parameters to form V-shaped pits simultaneously. Measurements by atomic force microscopy (AFM) and transmission electron microscopy (TEM) demonstrate the formation of MQWs on both (0001) and ([Formula: see text]) side surface of the V-shaped pits. The latter is known to be a semi-polar surface. Optical characterizations together with theoretical calculation enable us to identify the optical transitions from these MQWs. The layer thickness on ([Formula: see text]) surface is smaller than that on (0001) surface, and the energy level in the ([Formula: see text]) semi-polar quantum well (QW) is higher than in the (0001) QW. As the sample temperature is increased from 15 K, the integrated cathodoluminescence (CL) intensity of (0001) MQWs increases first and then decreases while that of the ([Formula: see text]) MQWs decreases monotonically. The integrated photoluminescence (PL) intensity of (0001) MQWs increases significantly from 15 to 70 K. These results are explained by carrier injection from ([Formula: see text]) to (0001) MQWs due to thermal excitation. It is therefore concluded that the emission efficiency of (0001) MQWs at high temperatures can be greatly improved due to the formation of semi-polar MQWs.

Rigorous microlens design using vector electromagnetic method combined with simulated annealing optimization.

In this paper, finite-aperture diffractive optical element with its critical dimension smaller than illumination wavelength is modeled and optimized using an integrated method. This method employs rigorous analysis model based on Finite Difference Time Domain (FDTD), and simulated annealing (SA) global search algorithm. Numerical results reveal that the diffraction efficiency of the 8-step microlens quickly climbs to its global optimum along with the optimization process, which manifests its global search ability. The design algorithm and implementation are discussed in details. Considering its time consuming efficiency and global search ability, our method provides valuable reference value in practical multistep microlens design.

Well-width dependence of the emission linewidth in ZnO/MgZnO quantum wells.

Photoluminescence (PL) spectra were measured as a function of well width (LW) and temperature in ZnO/Mg0.1Zn0.9O single quantum wells (QWs) with graded thickness. The emission linewidth (full width at half maximum) was extracted from the emission spectra, and its variation as a function of LW was studied. The inhomogeneous linewidth obtained at 5 K was found to decrease with increasing LW from 1.8 to 3.3 nm due to the reduced potential variation caused by the LW fluctuation. Above 3.3 nm, however, the linewidth became larger with increasing LW, which was explained by the effect related with defect generation due to strain relaxation and exciton expansion in the QW. For the homogenous linewidth broadening, longitudinal optical (LO) phonon scattering and impurity scattering were taken into account. The LO phonon scattering coefficient ΓLO and impurity scattering coefficient Γimp were deduced from the temperature dependence of the linewidth of the PL spectra. Evident reduction of ΓLO with decreasing LW was observed, which was ascribed to the confinement-induced enhancement of the exciton binding energy. Different from ΓLO, a monotonic increase in Γimp was observed with decreasing LW, which was attributed to the enhanced penetration of the exciton wave function into the barrier layers.

Performance enhancement of GaN-based light emitting diodes by transfer from sapphire to silicon substrate using double-transfer technique.

GaN-based light emitting diodes (LEDs) fabricated on sapphire substrates were successfully transferred onto silicon substrates using a double-transfer technique. Compared with the conventional LEDs on sapphire, the transferred LEDs showed a significant improvement in the light extraction and thermal dissipation, which should be mainly attributed to the removal of sapphire and the good thermal conductivity of silicon substrate. Benefited from the optimized wafer bonding process, the transfer processes had a negligible influence on electrical characteristics of the transferred LEDs. Thus, the transferred LEDs showed a similar current-voltage characteristic with the conventional LEDs, which is of crucial importance for practical applications. It is believed that the double-transfer technique offers an alternative way to fabricate high performance GaN-based thin-film LEDs.

[Bonding structure in silicon nitride thin films containing silicon nano-particles].

Non-stoichiometric hydrogenated amorphous silicon nitride (a-SiNx : H) film was deposited by helico-wave plasma-enhanced chemical vapour deposition (HWP-CVD) technique. The microstructure and bonding characteristics of both as-deposited and annealed thin films were studied. Raman scattering measurement shows that excess silicon exists in the form of amorphous silicon particles in the as-deposited sample. The microstructure of crystalline nano-particles silicon embedded in silicon nitride matrix in the post-annealed sample was formed. Comparing the results of both the Fourier transform infrared spectra and the optical absorption spectra of the samples deposited under different conditions, it is shown that the microstructure of the thin film depended on the gas flow ratio and annealing process. The sample with lower excess silicon shows a lower density of defect state at the silicon nanocrystal/SiNx interface due to a higher binding hydrogen content. The annealing process induces the decrease in Si-H and N--H binding densities. Because of the formation of silicon nanocrystals, the annealed samples exhibit a higher structure disorder degree.