Growth model with restricted surface relaxation.

We simulate a growth model with restricted surface relaxation process in d=1 and d=2, where d is the dimensionality of a flat substrate. In this model, each particle can relax on the surface to a local minimum, as the discrete surface relaxation model, but only within a distance s. If the local minimum is out from this distance, the particle evaporates through a refuse mechanism similar to the Kim-Kosterlitz nonlinear model. In d=1, the growth exponent beta, measured from the temporal behavior of roughness, indicates that in the coarse-grained limit, the linear term of the Kardar-Parisi-Zhang equation dominates in short times (low-roughness) and, in asymptotic times, the nonlinear term prevails. The crossover between linear and nonlinear behaviors occurs in a characteristic time t(c) which only depends on the magnitude of the parameter s, related to the nonlinear term. In d=2, we find indications of a similar crossover, that is, logarithmic temporal behavior of roughness in short times and power law behavior in asymptotic times.

Kinetic roughening model with opposite Kardar-Parisi-Zhang nonlinearities.

We introduce a model that simulates a kinetic roughening process with two kinds of particle: one follows ballistic deposition (BD) kinetics and the other restricted solid-on-solid Kim-Kosterlitz (KK) kinetics. Both of these kinetics are in the universality class of the nonlinear Kardar-Parisi-Zhang equation, but the BD kinetics has a positive nonlinear constant while the KK kinetics has a negative one. In our model, called the BD-KK model, we assign the probabilities p and (1-p) to the KK and BD kinetics, respectively. For a specific value of p, the system behaves as a quasilinear model and the up-down symmetry is restored. We show that nonlinearities of odd order are relevant in this low nonlinear limit.