A numerical investigation of the effect of external resistance and applied potential on the distribution of periodicity and chaos in the anodic dissolution of nickel.

The oscillatory electrodissolution of nickel is one among several reactions utilized as a model-system to study the emergence of oscillations and pattern formation in electrochemical interfaces, in addition to frequently providing experimental proofs for theoretical predictions in synchronization engineering. The reaction was modeled in 1992 by Haim and co-workers [J. Phys. Chem. 1992, 96, 2676] and since then the model has been used with great success. Although some numerical studies have been done in this regard, there is apparently no detailed investigation of the effect of control parameters on the complex dynamics of nickel dissolution. Here, we provide a well-detailed and rigorous analysis of the effect of the external resistance and applied potential by simulating high-resolution phase diagrams based on the calculation of Lyapunov exponents and isospike diagrams. Our findings clearly indicate a strong dependence of the self-similar periodic islands, the so-called shrimps (i.e., periodic islands within chaotic domains in the parameter space), with the control parameters. Overall, we have observed a low density of periodic structures in the phase diagrams, being completely suppressed for large values of resistance and potential. The shrimp-like structures become gradually elongated with an increase of the control parameters to the point where only diagonally aligned periodic bands intertwined with chaotic domains are present. Interestingly, period-doubling cascades were observed not only on the shrimps but also on the periodic bands. The detailed distribution of chaos and periodicity of oscillatory electrodissolution reactions in resistance-potential phase diagrams can bring, for instance, important information to experimentalists to set a desired dynamic behavior and, therefore, to create novel nanostructured self-organized materials.

Modulation of Turing Patterns in the CDIMA Reaction by Ultraviolet and Visible Light.

We have carried out the first systematic study of the effects of ultraviolet light, both alone and in combination with visible white light, on Turing patterns in the chlorine dioxide-iodine-malonic acid (CDIMA) reaction. The ultraviolet light used has a sharp peak at 368 nm and can perturb the system selectively. It primarily decomposes chlorine dioxide in a zeroth-order reaction, and when it is used to illuminate Turing patterns, shrunken spots are formed with an imperfect hexagonal arrangement. The ultraviolet light competes directly with the visible white light via the photoreaction with dissolved chlorine dioxide, which prevents the total suppression of patterns at intermediate intensities of white light. These results suggest that specific wavelengths of light in the ultraviolet spectrum selectively modify the chemistry behind the pattern formation and can be utilized to generate novel self-organized structures under forcing conditions. We propose a modified Lengyel-Epstein model to incorporate the effect of ultraviolet illumination and obtain good qualitative agreement between simulations and experiments. These results support the idea that chlorine dioxide photoreaction is a key step in modulating CDIMA patterns under ultraviolet illumination.