Validation of algorithms for donning and doffing personal protective equipment during the COVID-19 pandemic
J. coloproctol. (Rio J., Impr.)
; 41(4): 367-374, Out.-Dec. 2021. tab, ilus
Article
in English
| LILACS
| ID: biblio-1356445
Responsible library:
BR545.3
ABSTRACT
Introduction:
The prolonged or incorrect use of facial masks, respirators and glasses or visors results in friction, pressure and shear forces that constantly act on the facial skin, leading to lesions and dermatitis.Objective:
To develop and validate algorithms to guide health professionals in the correct use of personal protective equipment (PPE) and indicate preventive measures against skin injuries caused by inappropriate use during the COVID-19 pandemic.Methods:
For the develoment of the algorithms, an integrative literature review was performed using the following databases PubMed, SciELO, and LILACS. The algorithms were evaluated by 59 health professionals (nurses, doctors, and physiotherapists), using the Delphi technique. A content validity index (CVI) was used for the statistical analysis.Results:
The experts classified the items of the algorithms from fully inadequate to fully adequate in the first round of consultations, and from partially adequate to fully adequate in the second round. The overall CVI values were of 0.83 and 1.0 in the first and second rounds respectively.Conclusion:
The algorithms validated by the expert panel can be used by health professionals when donning and doffing PPE, and to prevent the facial-skin lesions caused by their use. (AU)
Full text:
Available
Collection:
International databases
Health context:
SDG3 - Target 3.3 End transmission of communicable diseases
Health problem:
Pneumonia
Database:
LILACS
Main subject:
Algorithms
/
Personal Protective Equipment
/
COVID-19
Limits:
Female
/
Humans
/
Male
Language:
English
Journal:
J. coloproctol. (Rio J., Impr.)
Journal subject:
Cirurgia
/
Doenas Retais
/
Doenas do Colo
/
Gastroenterology
/
Cirurgia
Year:
2021
Document type:
Article
Affiliation country:
Brazil
Institution/Affiliation country:
Universidade do Vale do Sapucaí/BR