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Effect of Chemical Microenvironment in Spirothiopyran Monolayer Direct-Write Photoresists.
Vijayamohanan, Harikrishnan; Bhide, Parth; Boyd, Dante; Zhou, Zhe; Palermo, Edmund F; Ullal, Chaitanya K.
Affiliation
  • Vijayamohanan H; Department of Materials Science and Engineering , Rensselaer Polytechnic Institute , 110 8th Street , Troy , New York 12180 , United States.
  • Bhide P; Department of Materials Science and Engineering , Rensselaer Polytechnic Institute , 110 8th Street , Troy , New York 12180 , United States.
  • Boyd D; Department of Materials Science and Engineering , Rensselaer Polytechnic Institute , 110 8th Street , Troy , New York 12180 , United States.
  • Zhou Z; Department of Materials Science and Engineering , Rensselaer Polytechnic Institute , 110 8th Street , Troy , New York 12180 , United States.
  • Palermo EF; Department of Materials Science and Engineering , Rensselaer Polytechnic Institute , 110 8th Street , Troy , New York 12180 , United States.
  • Ullal CK; Department of Materials Science and Engineering , Rensselaer Polytechnic Institute , 110 8th Street , Troy , New York 12180 , United States.
Langmuir ; 35(11): 3871-3879, 2019 Mar 19.
Article in En | MEDLINE | ID: mdl-30807181
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Full text: 1 Collection: 01-internacional Database: MEDLINE Type of study: Clinical_trials Language: En Journal: Langmuir Journal subject: QUIMICA Year: 2019 Document type: Article Affiliation country: United States Country of publication: United States
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Full text: 1 Collection: 01-internacional Database: MEDLINE Type of study: Clinical_trials Language: En Journal: Langmuir Journal subject: QUIMICA Year: 2019 Document type: Article Affiliation country: United States Country of publication: United States