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Tuning Electrochemical Bistability by Surface Area Blocking in the Cathodic Deposition of Copper.
Rospendowiski, Júlia; Pinto, Maria R; Hessel, Cristian; Sitta, Elton; Nagao, Raphael.
Affiliation
  • Rospendowiski J; Institute of Chemistry, University of Campinas, CEP 13083-970 Campinas, Sao Paulo, Brazil.
  • Pinto MR; Institute of Chemistry, University of Campinas, CEP 13083-970 Campinas, Sao Paulo, Brazil.
  • Hessel C; Department of Chemistry, Federal University of Sao Carlos, CEP 13565-905 Sao Carlos, Sao Paulo, Brazil.
  • Sitta E; Department of Chemistry, Federal University of Sao Carlos, CEP 13565-905 Sao Carlos, Sao Paulo, Brazil.
  • Nagao R; Center for Innovation on New Energies, University of Campinas, CEP 13083-841 Campinas, Sao Paulo, Brazil.
ACS Omega ; 3(10): 13636-13646, 2018 Oct 31.
Article in En | MEDLINE | ID: mdl-31458069
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: ACS Omega Year: 2018 Document type: Article Affiliation country: Brazil Country of publication: United States
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: ACS Omega Year: 2018 Document type: Article Affiliation country: Brazil Country of publication: United States