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Record Surface State Mobility and Quantum Hall Effect in Topological Insulator Thin Films via Interface Engineering.
Koirala, Nikesh; Brahlek, Matthew; Salehi, Maryam; Wu, Liang; Dai, Jixia; Waugh, Justin; Nummy, Thomas; Han, Myung-Geun; Moon, Jisoo; Zhu, Yimei; Dessau, Daniel; Wu, Weida; Armitage, N Peter; Oh, Seongshik.
Afiliação
  • Wu L; Department of Physics and Astronomy, The Johns Hopkins University , Baltimore, Maryland 21218, United States.
  • Waugh J; Department of Physics, University of Colorado , Boulder, Colorado 80309, United States.
  • Nummy T; Department of Physics, University of Colorado , Boulder, Colorado 80309, United States.
  • Han MG; Condensed Matter Physics and Materials Science, Brookhaven National Lab , Upton, New York 11973, United States.
  • Zhu Y; Condensed Matter Physics and Materials Science, Brookhaven National Lab , Upton, New York 11973, United States.
  • Dessau D; Department of Physics, University of Colorado , Boulder, Colorado 80309, United States.
  • Armitage NP; Department of Physics and Astronomy, The Johns Hopkins University , Baltimore, Maryland 21218, United States.
Nano Lett ; 15(12): 8245-9, 2015 Dec 09.
Article em En | MEDLINE | ID: mdl-26583739
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nano Lett Ano de publicação: 2015 Tipo de documento: Article País de publicação: Estados Unidos
Texto completo
Adicionar na Minha BVS
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nano Lett Ano de publicação: 2015 Tipo de documento: Article País de publicação: Estados Unidos