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Impact of N Incorporation on VLS Growth of GaP(N) Nanowires Utilizing UDMH.
Steidl, Matthias; Wu, Mingjian; Peh, Katharina; Kleinschmidt, Peter; Spiecker, Erdmann; Hannappel, Thomas.
Afiliação
  • Steidl M; Department of Photovoltaics, Institute of Physics and Institute of Micro- and Nanotechnologies, Technische Universität Ilmenau|, 98693, Ilmenau, Germany. matthias.steidl@tu-ilmenau.de.
  • Wu M; Institute of Micro- and Nanostructure Research & Center for Nanoanalysis and Electron Microscopy (CENEM), Department of Materials Science, Friedrich-Alexander-Universität Erlangen-Nürnberg, 91058, Erlangen, Germany.
  • Peh K; Department of Photovoltaics, Institute of Physics and Institute of Micro- and Nanotechnologies, Technische Universität Ilmenau|, 98693, Ilmenau, Germany.
  • Kleinschmidt P; Department of Photovoltaics, Institute of Physics and Institute of Micro- and Nanotechnologies, Technische Universität Ilmenau|, 98693, Ilmenau, Germany.
  • Spiecker E; Institute of Micro- and Nanostructure Research & Center for Nanoanalysis and Electron Microscopy (CENEM), Department of Materials Science, Friedrich-Alexander-Universität Erlangen-Nürnberg, 91058, Erlangen, Germany.
  • Hannappel T; Department of Photovoltaics, Institute of Physics and Institute of Micro- and Nanotechnologies, Technische Universität Ilmenau|, 98693, Ilmenau, Germany. thomas.hannappel@tu-ilmenau.de.
Nanoscale Res Lett ; 13(1): 417, 2018 Dec 29.
Article em En | MEDLINE | ID: mdl-30594986

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanoscale Res Lett Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Alemanha País de publicação: Estados Unidos

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanoscale Res Lett Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Alemanha País de publicação: Estados Unidos