Deep reactive ion etching of cylindrical nanopores in silicon for photonic crystals.

Goodwin, Melissa J; Harteveld, Cornelis A M; de Boer, Meint J; Vos, Willem L

Goodwin, Melissa J; Harteveld, Cornelis A M; de Boer, Meint J; Vos, Willem L.

Afiliação

Goodwin MJ; Complex Photonic Systems (COPS), MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands.
Harteveld CAM; Complex Photonic Systems (COPS), MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands.
de Boer MJ; MESA+ Nanolab, MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands.
Vos WL; Complex Photonic Systems (COPS), MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands.

Nanotechnology ; 34(22)2023 Mar 16.

Article em En | MEDLINE | ID: mdl-36928122

Palavras-chave

photonic crystals; reactive ion etching; silicon nanophotonics

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2023 Tipo de documento: Article País de afiliação: Holanda País de publicação: Reino Unido

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