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Probing the Spatial Homogeneity of Exfoliated HfTe5 Films.
Singh, Maanwinder P; Dong, Qingxin; Chen, Gen-Fu; Holleitner, Alexander W; Kastl, Christoph.
Afiliação
  • Singh MP; Walter Schottky Institute and Physics Department, Technical University of Munich, Am Coulombwall 4a, 85748 Garching, Germany.
  • Dong Q; Munich Center for Quantum Science and Technology (MCQST), Schellingstr. 4, 80799 Munich, Germany.
  • Chen GF; Institute of Physics and Beijing National Laboratory for Condensed Matter Physics, Chinese Academy of Sciences, 100190 Beijing, China.
  • Holleitner AW; School of Physical Sciences, University of Chinese Academy of Sciences, 100049 Beijing, China.
  • Kastl C; Institute of Physics and Beijing National Laboratory for Condensed Matter Physics, Chinese Academy of Sciences, 100190 Beijing, China.
ACS Nano ; 18(28): 18327-18333, 2024 Jul 16.
Article em En | MEDLINE | ID: mdl-38958041
ABSTRACT
In van der Waals materials, external strain is an effective tool to manipulate and control electronic responses by changing the electronic bands upon lattice deformation. In particular, the band gap of the layered transition metal pentatelluride HfTe5 is sufficiently small to be inverted by subtle changes of the lattice parameters resulting in a strain-tunable topological phase transition. In that case, knowledge about the spatial homogeneity of electronic properties becomes crucial, especially for the microfabricated thin film circuits used in typical transport measurements. Here, we reveal the homogeneity of exfoliated HfTe5 thin films by spatially resolved Raman microscopy. Comparing the Raman spectra under applied external strain to unstrained bulk references, we pinpoint local variations of Raman signatures to inhomogeneous strain profiles in the sample. Importantly, our results demonstrate that microfabricated contacts can act as sources of significant inhomogeneities. To mitigate the impact of unintentional strain and its corresponding modifications of the electronic structure, careful Raman microscopy constitutes a valuable tool for quantifying the homogeneity of HfTe5 films and circuits fabricated thereof.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Nano Ano de publicação: 2024 Tipo de documento: Article País de afiliação: Alemanha País de publicação: Estados Unidos

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Nano Ano de publicação: 2024 Tipo de documento: Article País de afiliação: Alemanha País de publicação: Estados Unidos