ABSTRACT
The lowest limit for detection (LLD) of the impurity concentration doped in semiconductors in the case of fluorescence XAFS measurements has been investigated as a function of the matrix of the impurity and the geometry of the measurement. When the impurity concentration is very low and other background noise is well suppressed, X-ray resonant Raman scattering by the constituent atoms of the matrix remains as a major background for the fluorescence-detected XAFS measurement. For example, in the fluorescence-detected XAFS measurement for Er-doped semiconductors at the Er L(III)-edge, the LLD of the Er concentration was about 5 x 10(14) to 1 x 10(15) cm(-2) for GaAs and GaP, and lower than 1 x 10(14) cm(-2) for InP. The resonant Raman scattering of Ga atoms in the host semiconductor determines the LLD.
Subject(s)
Erbium/analysis , Manufactured Materials/analysis , Materials Testing/methods , Microchemistry/methods , Refractometry/methods , Semiconductors , Spectrometry, X-Ray Emission/methods , Spectrum Analysis, Raman/methods , Scattering, RadiationABSTRACT
For understanding the luminescence of Er atoms in III-V semiconductors, OMVPE-grown InP doped with Er has been investigated by fluorescence EXAFS (extended X-ray absorption fine structure) in order to study the local structure around Er atoms. The local structures around the Er atoms doped in InP, with doping as dilute as 3 x 10(12) Er atoms in a 1.5 mm x 1.0 mm spot, were successfully measured by fluorescence EXAFS. The EXAFS analysis revealed that the Er atoms doped in InP above 853 K (which showed low luminescence) formed the rock-salt-structure ErP, while the Er atoms doped in InP below 823 K (which showed high luminescence) substituted on the In site of InP. The dependence of the local structure on growth temperature was observed for the samples doped with 3 x 10(12) atoms and 1.2 x 10(13) atoms of Er.